The advantage of this process is less damaged surface through missing ion bombardment.

Developed the methodology and created the first industrial installation for etching surface structure by ion bombardment.

Another two hours and fourteen buoys later, and the ion bombardment began to decrease.

Thus, all surfaces exposed to the plasma receive energetic ion bombardment.

Thus, films can be exposed to energetic ion bombardment during deposition.

These large voltages lead to high-energy ion bombardment of surfaces.

Then electrons can leave the electrodes just by high electric field and ion bombardment.

Similar to sputtering, the re-emission is caused by ion bombardment of the deposited material.

He discovered how to protect thermionic cathodes from rapid disintegration under ion bombardment.

Design of equipment for deposition of thin films in the presence of ion bombardment.