electron-beam lithography

As mentioned above, electron-beam lithography is inherently a multiple exposure technique.

These types of hologram are created using highly sophisticated and very expensive electron-beam lithography systems.

Electron-beam lithography had been viewed as having great promise in the early 1980's, but more recently has languished with little financing.

The effectiveness of electron-beam lithography was also being researched at the beginning of the new millennium for nanometer-scale applications.

During his career he established a world class team and led the development of several generations of IBM's electron-beam lithography systems.

Another alternative in electron-beam lithography is to use extremely high electron energies (at least 100 keV) to essentially "drill" or sputter the material.

For example, proximity effect correction in electron beam lithography is included as an automated capability on commercial electron-beam lithography tools.

Eventually electron-beam lithography may find use in the fabrication of ultra-small components of integrated-circuit chips, Dr. Craighead said.

Direct-write electron-beam lithography is inherently a multiple exposure technique, as the beam is shaped and projected onto the resist at multiple locations.

It was built to demonstrate the capability of a new system of high-voltage electron-beam lithography, a technology that will be used to probe matter on a tiny scale.

"Multilevel Phase Holograms Manufactured by Electron-Beam Lithography".

Another Way to Etch Circuits Electron-beam lithography involves steering a powerful beam of electrons to directly "write" circuit patterns on silicon wafers.

Despite the high resolution of electron-beam lithography, the generation of defects during electron-beam lithography is often not considered by users.

The gold plate in the center of the MWNT is patterned using electron-beam lithography and Cr/Au evaporation.

Even with a next-generation lithography like EUVL or maskless direct-write electron-beam lithography, a second exposure is still required for cutting.

It includes fabrication tools for processes including electron-beam lithography, photolithography, chemical vapor deposition, electron-beam deposition and reactive ion etching.

Much Slower Process Electron-beam lithography has long promised remarkably fine resolution, giving chip makers the ability to create microscopic electronic circuits denser than is possible with optical methods.

But a third group of researchers argues that the nation should re-evaluate a technology known as electron-beam lithography, which involves steering a powerful beam of electrons to "write" circuit patterns on wafers.

The Center for Nanoscale Lithography is a partnership between CNSE and Vistec Lithography to develop advances in electron-beam lithography, used in nanoelectronics manufacturing.

The nanostructures vary from superconductors to biopolymers and are obtained from nature or fabricated with bottom-up methods (starting with atoms or molecules) or top-down techniques (such as electron-beam lithography).

While he was a graduate student at MIT, IMRE's Dr. Joel Yang developed a new electron-beam lithography process which uses sodium chloride to enhance the developer solution.

Lattice constants of atomic crystals are of the order of 1Å while those of superlattices (a) are several hundreds or thousands larger as dictated by technological limits (e.g. electron-beam lithography used for the patterning of the heterostructure surface).