electrochemical etching

The foil is roughened by electrochemical etching to enlarge the effective capacitive surface.

When the stamp is contacted with metal, electrochemical etching can be carried out with an applied voltage.

Tungsten tips are usually made by electrochemical etching, and platinum-iridium tips by mechanical shearing.

Electrochemical etching (ECE) for dopant-selective removal of silicon is a common method to automate and to selectively control etching.

A sponge-like porous form of silicon (p-Si) is typically prepared by the electrochemical etching of silicon wafers in a hydrofluoric acid solution.

Observation of the Different Electrochemical Etching Rates of p and n Type Semiconductors (Max Planck Inst.

Further mechanisms supporting the bonding process of not completely inert anodic materials can be the planarization or polishing of surfaces and the ablation of the surface layer by electrochemical etching.

P-beam writing produces resistive patterns at depth in silicon, allowing patterning of selective regions with different optical properties as well as the removal of undamaged regions via electrochemical etching.

Advance electrochemical etching techniques for CR-39 now yield a dose equivalent response that is nearly constant from 0.1 to 4.0 MeV. Recent studies include use of convertors to enhance CR-39 response at both low and high energies.

Other methods for forming a similar structure include electrochemical etching, stain etching, metal-assisted chemical etching, and laser treatment (which is developed in Eric Mazur's laboratory at Harvard University ), and FFC Cambridge process (an electrochemical reduction process).