chemical vapour deposition , CVD (Abkürzung)

Entirely new processes such as sol-gel processing, chemical vapour deposition are being developed.

It is also used in chemical vapour deposition where boron and carbon need to be deposited together.

Barium acetylacetonate has uses in metal organic chemical vapour deposition.

Glove box and metal organic chemical vapour deposition.

In the semiconductor industry, chlorine trifluoride is used to clean chemical vapour deposition chambers.

Key words: scanning tunnelling microscopy, chemical vapour deposition, zinc, copper.

Chemical vapour deposition (CVD) is well suited for this purpose.

ALD is considered a subclass of chemical vapour deposition.

This borrows techniques from the semiconductor industry, such as chemical vapour deposition, and is very useful for coatings.

Chemical vapour deposition furnaces designed or modified for the densification of carbon-carbon composites.

Tantalum(V) ethoxide optical coatings can be produced by low pressure chemical vapour deposition.

Chemical vapour deposition allows control of the thickness of the film on a nanometre scale, which is essential for some applications.

Gold is also a convenient choice for nanofabrication because of its unreactivity and ease of use with chemical vapour deposition.

After cleaning the glass superstrate, a multilayer stack is deposited onto it by a technique such as chemical vapour deposition.

In 1992, breakthroughs in chemical vapour deposition technology opened the opportunity to synthesize diamond films and a new raft of application areas became possible.

They can be grown using chemical vapour deposition on Zinc oxide nanowires (diameters of 30-200 nm).

Chemical vapour deposition (CVD) and reactor design.

Growth of semiconductor and oxide insulator thin films using chemical vapour deposition and solution deposition.

On the other hand, carbon formation is necessary in the production of carbon black and in chemical vapour deposition on solid objects.

The commercial production of boron filaments is based exclusively upon the chemical vapour deposition process (CVD).

Fluoroptic probes are immune to the hostile environment encountered in chemical vapour deposition, plasma etching and sputtering processes.

Equipment for the chemical vapour deposition of elements or compounds on heated filamentary substrates to manufacture silicon carbide fibres; 3.

Apparatus for chemical vapour deposition on LCD substrates 8419.90 ex Parts:

These conditions obtain during plasma assisted chemical vapour deposition (PACVD).

The so-called remote combustion chemical vapour deposition is a new variant of the classical CCVD process.